Optical Lithography in Semiconductors

Optical Lithography in Semiconductors

  • Submitted By: nickernicks
  • Date Submitted: 03/20/2011 7:55 PM
  • Category: Science
  • Words: 1121
  • Page: 5
  • Views: 231

Introduction:
 
  Semiconductor
  devices
  have
  undoubtedly
  become
  an
  integral
  part
  towards
  business
  driven
  towards
  world
  use
  increased
  efficiency
  and
  personal
  benefit
  in
  the
  computer
  realm,
  from
  the
  proliferant
  use
  of
  personal
  computers
  for
  entertainment,
  internet
  to
  supercomputers
  for
  research
  and
  extensive
  calculations.
  As
  the
  growing
  demand
  for
  media
  rich
  entertainment
  and
  processor
  intensive
  environments
  continues,
  there
  is
  a
  requirement
  for
  increased
  speed
  from
  the
  individual
  components.
  Key
  aspect
  of
  processor
  speed
  is
  determined
  by
  the
  number
  of
  components
  and
  transistors
  present,
  therefore,
  without
  increasing
  the
  size
  of
  the
  computers,
  need
  to
  have
  smaller
  and
  smaller
 features,
 in
 addition
 to
 more
 efficient
 heat
 transfer
 and
 efficiency.
 These
 require
  particular
 materials
 and
 smaller
 gate
 lengths
 as
 it
 controls
 how
 fast
 processing
 occurs.
  Describe
 Current
 technology:
 Optical
 Lithography
  Patterning
 of
 circuits
 for
 chips
 involves
 an
 extensive
 process
 which
 undergoes
 a
 number
  of
  iterations
  for
  various
  layers
  to
  build
  up
  the
  semiconductor
  chip
  structure.
  Firstly
  a
  thin
  film
  oxide
  layer
  is
  deposited
  using
  pulsed
  laser
  deposition
  onto
  the
  silicon
  substrate,
  followed
  by
  a
 ...

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